Observation of Tunneling Current in Semiconducting Graphene p-n Junctions

被引:7
|
作者
Miyazaki, Hisao [1 ,2 ]
Lee, Michael V. [1 ]
Li, Song-Lin [1 ]
Hiura, Hidefumi [1 ,3 ]
Kanda, Akinobu [2 ,4 ]
Tsukagoshi, Kazuhito [1 ,2 ]
机构
[1] Natl Inst Mat Sci, MANA, Tsukuba, Ibaraki 3050047, Japan
[2] Japan Sci & Technol Agcy, CREST, Kawaguchi, Saitama 3320012, Japan
[3] NEC Corp Ltd, Tsukuba, Ibaraki 3058501, Japan
[4] Univ Tsukuba, Inst Phys, Tsukuba, Ibaraki 3058571, Japan
基金
日本学术振兴会;
关键词
bilayer graphene; field effect; p-n junction; tunneling effect; BILAYER GRAPHENE; CONDUCTANCE; BANDGAP; BRIDGE;
D O I
10.1143/JPSJ.81.014708
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
We demonstrate a tunneling and rectification behavior in bilayer graphene. A stepped dielectric top gate creates a spatially modulated electric field, which opens the band gap in the graphene and produces an insulating region at the p-n interface. A current-voltage relationship exhibiting differential resistance peak at forward bias stems from the tunneling current through the insulating region at the p-n interface. The tunneling current reflects singularities in the density of states modified by the electric field. This work suggests that the effect of carrier charge tuning by external electric field in 2D semiconductors is analogously to that by impurity doping in 3D semiconductors.
引用
收藏
页数:7
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