Control of the composition of (Pb,Ti)O3 and Pb(Zr,Ti)O3 thin films obtained by RF magnetron sputtering using a new design of target

被引：1

作者：

Lefort-Courtois, V ^{[1
]}

Remiens, D ^{[1
]}

Descamps, M ^{[1
]}

Thierry, B ^{[1
]}

机构：

[1] Univ Valenciennes & Hainaut Cambresis, Lab Mat Avances Ceram, F-59600 Maubeuge, France

来源：

JOURNAL OF THE EUROPEAN CERAMIC SOCIETY | 1999年 / 19卷 / 6-7期

关键词：

target; films; tape casting; PZT;

D O I：

10.1016/S0955-2219(98)00439-7

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

A new generation of target has been identified to deposit lead based perovskite films through the RF magnetron sputtering method. PbTiO3 and Pb (Zr,Ti)O-3 thin films were sputtered from (PbO, TiO2) and (PbO, TiO2, ZrO2) targets. The film composition was controlled by simply modifying the thickness of each oxide layer. The sputtered area of each oxide is also well-defined and allows to achieve reliable compositions of the film deposited. Relations were established between the compositions of the target and the films. The evaluation of each oxide area could also be calculated corresponding to any desired film composition whatever the element. Better distribution of the doping agent was also achieved with this multilayer target. (C) 1999 Elsevier Science Limited. All rights reserved.

引用

页码：1373 / 1377

页数：5

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