Ultra-Low-Temperature Epitaxy of Ge-based Semiconductors and Optoelectronic Structures on Si(100): Introducing Higher Order Germanes (Ge3H8, Ge4H10)

被引:35
作者
Grzybowski, Gordon
Jiang, Liying
Beeler, Richard T.
Watkins, Tylan
Chizmeshya, Andrew V. G.
Xu, Chi
Menendez, Jose
Kouvetakis, John [1 ]
机构
[1] Arizona State Univ, Dept Chem & Biochem, Tempe, AZ 85287 USA
基金
美国国家科学基金会;
关键词
trigermane; tetragermane; IR optoelectonics; Ge on Si; GeSn alloys; SI; PRECURSORS; HYDRIDES; BUTANE;
D O I
10.1021/cm3002404
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
This paper reports the development and optimization of an enhanced process to produce viable quantities of trigermane, and controlled smaller quantities tetragermane, which are isolated as a mixture of perfectly stable isomers. The identity and fundamental structural properties of these higher order germanes (Ge3H8, and Ge4H10 isomers) are thoroughly characterized using spectroscopic methods and quantum chemical simulations. These hydride products are found to exhibit a remarkably good stability and "ease of use", making them compatible with current industry standards. As a proof-of-concept, we demonstrate that Ge3H8 and Ge4H10 both represent efficient and cost-effective precursors for ultra-low-temperature chemical vapor deposition of pure Ge and GeSn alloy films directly on Si(100) wafers, at conditions compatible with processes currently employed in next-generation group IV device designs. In the case of Ge the crystallinity of the resultant films is found of optical quality, in spite of the extremely low temperature processing, suggesting the potential for rapid adoption of the new processes into the device application arena. In the case of GeSn alloys, the high growth rates achieved at low temperatures (similar to 300 degrees C) allow the formation of highly concentrated bulk-like layers with unprecedented thicknesses compatible with Si-based photonic applications such as infrared (IR) emitters and detectors directly on Si wafers.
引用
收藏
页码:1619 / 1628
页数:10
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