Top-down and bottom-up through-thickness current anisotropy in a bilayer YBa2Cu3O7-x film

被引：15

作者：

Chen, Z. J.

Feldmann, D. M.

Larbalestier, D. C.

Holesinger, T. G.

Li, X.

Zhang, W.

Rupich, M. W.

机构：

[1] Univ Wisconsin, Madison, WI 53706 USA

[2] Los Alamos Natl Lab, Los Alamos, NM 87545 USA

[3] Amer Superconductor, Westborough, MA 01581 USA

来源：

APPLIED PHYSICS LETTERS | 2007年 / 91卷 / 05期

关键词：

D O I：

10.1063/1.2767772

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The authors find the critical current anisotropy of a bilayer YBa2Cu3O7-delta film with different pinning structures in each layer is the sum of the anisotropy of the two individual layers, revealing that it is possible to tune the anisotropy of the composite through variation of an individual layer's thickness and pinning structure. YBa2Cu4Ox intergrowths and Dy2O3 nanodots were the dominant pinning structures in the top and bottom layers, respectively. The bottom layer of the composite was isolated using traditional Ar+ ion milling and the top layer was isolated using a focused ion beam, allowing each layer to be studied independently. (c) 2007 American Institute of Physics.

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页数：3

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