Study on the Cathodic process of titanium electrode in the [Bmim] OTf-SiCl4-PC system by electrochemically. Analysis on the mechanism of silicon deposition, and electrodeposition experiments. The results showed that: Cathodic reaction is an irreversible reaction, Silicon ions in the titanium electrode nucleation process is instantaneous nucleation hemispherical diffusion growth process, DC current density: 2.7mA.cm(-2), Temperature: 40 degrees C, obtain a dense deposits.