The Electrochemical Behavior of Silicon on the Titanium Electrodes in [Bmim] OTf-SiCl4-PC System

被引:0
作者
Zhang, Yuehong [1 ]
Li, Yaqiong [2 ]
Li, Binchuan [1 ]
Tao, Shaohu [1 ]
机构
[1] Northeastern Univ Qinhuangdao, Qinhuangdao 066004, Hebei, Peoples R China
[2] Dalian Univ Technol, Dalian 116024, Liaoning, Peoples R China
来源
2015 2ND INTERNATIONAL CONFERENCE ON INTELLIGENT MATERIALS AND MECHATRONICS (IMM 2015) | 2015年
关键词
Silicon; Ionic liquids; Electrodeposition; Electrochemistry; TEMPERATURE IONIC LIQUID; ROOM-TEMPERATURE; MOLTEN-SALT; CHLORIDE; ALUMINUM; GOLD; TI;
D O I
暂无
中图分类号
TP [自动化技术、计算机技术];
学科分类号
0812 ;
摘要
Study on the Cathodic process of titanium electrode in the [Bmim] OTf-SiCl4-PC system by electrochemically. Analysis on the mechanism of silicon deposition, and electrodeposition experiments. The results showed that: Cathodic reaction is an irreversible reaction, Silicon ions in the titanium electrode nucleation process is instantaneous nucleation hemispherical diffusion growth process, DC current density: 2.7mA.cm(-2), Temperature: 40 degrees C, obtain a dense deposits.
引用
收藏
页码:101 / 104
页数:4
相关论文
共 9 条