Annealing effects on the structural properties of gold films on Si by the RF magnetron sputtering

被引：6
|
作者：
Lee, KC
Kim, NH
O, BH
Kim, HW
机构：
[1] Inha Univ, Sch Informat & Commun Engn, Micro Photon Adv Res Ctr, Inchon 402751, South Korea
[2] Inha Univ, Sch Mat Sci & Engn, Inchon 402751, South Korea
来源：
PRICM 5: THE FIFTH PACIFIC RIM INTERNATIONAL CONFERENCE ON ADVANCED MATERIALS AND PROCESSING, PTS 1-5 | 2005年 / 475-479卷
关键词：
gold; annealing; RF magnetron sputtering;
D O I：
10.4028/www.scientific.net/MSF.475-479.3923
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
We have investigated the effect of annealing temperature on the structural property of Au thin films deposited on Si(100) substrate using the radio frequency (RF) magnetron sputtering technique. X-ray diffraction revealed that the relative intensities and FWHM of (111), (200), and (311) peaks increased and decreased, respectively, after thermal annealing at 600 C. Scanning electron microscopy indicated that after annealing at 600-700 degrees C, Au structures agglomerated on Si(100) surfaces. Energy dispersive x-ray spectrometry (EDX) revealed that the agglomerated structure was composed of pure Au.
引用
收藏
页码：3923 / 3926
页数：4
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