Effects of very thin strain layers on dielectric properties of epitaxial Ba0.6Sr0.4TiO3 films

被引:173
|
作者
Park, BH
Peterson, EJ
Jia, QX
Lee, J
Zeng, X
Si, W
Xi, XX
机构
[1] Los Alamos Natl Lab, Los Alamos, NM 87545 USA
[2] Sungkyunkwan Univ, Dept Mat Engn, Suwon 440746, South Korea
[3] Penn State Univ, Dept Phys, University Pk, PA 16802 USA
关键词
D O I
10.1063/1.1340863
中图分类号
O59 [应用物理学];
学科分类号
摘要
We have epitaxially grown Ba0.6Sr0.4TiO3 (BST-0.4) thin films on MgO(001) substrates. By inserting a very thin Ba1-xSrxTiO3 (x=0.1-0.7) interlayer between the MgO substrate and the main layer of BST-0.4, we are able to manipulate the degree of the stress in BST-0.4 films. We have controlled the stress states, i.e., the lattice distortion ratio (D=in-plane lattice constant/out-of-plane lattice constant) of the BST-0.4 films by varying the chemical composition of the interlayers. We have found that small variations of D value can result in significantly large changes of dielectric properties. A BST-0.4 film under small tensile stress, which has a D value of 1.0023, shows the largest dielectric permittivity and tunability. (C) 2001 American Institute of Physics.
引用
收藏
页码:533 / 535
页数:3
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