A Charge-Based Capacitance Model for Double-Gate Tunnel FETs With Closed-Form Solution

被引:20
|
作者
Lu, Bin [1 ]
Lu, Hongliang [1 ]
Zhang, Yuming [1 ]
Zhang, Yimen [1 ]
Cui, Xiaoran [1 ]
Lv, Zhijun [1 ]
Yang, Shizheng [1 ]
Liu, Chen [1 ]
机构
[1] Xidian Univ, Sch Microelect, State Key Lab Wide Bandgap Semicond Technol, Xian 710071, Shaanxi, Peoples R China
关键词
Capacitance model; source depletion length; terminal charges; tunnel field-effect transistor (TFET); FIELD-EFFECT TRANSISTORS; THRESHOLD VOLTAGE; DRAIN CURRENT; N TFET; SI;
D O I
10.1109/TED.2017.2775341
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Based on an analytical surface potential and a simple mathematical approximation for the source depletion width, a physics-based capacitance model with closed form for silicon double-gate tunnel field-effect transistors (TFETs) is developed. Good agreements between the proposed model and the numerical simulations have been achieved, which reveal that the tunneling carriers from source have negligible contribution to the channel charges and the gate capacitance can be almost acted as the gate drain capacitance, which is quite different from that of MOSFETs. This model without involving any iterative process is more SPICE friendly for circuit simulations compared with the table-lookup approach and would be helpful for developing the transient performance of TFET-based circuits.
引用
收藏
页码:299 / 307
页数:9
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