Influence of substrate temperature on mechanical, optical and electrical properties of ZnO:Al films

被引：70

作者：

Wen, Ruitao ^{[1
]}

Wang, Laisen ^{[1
]}

Wang, Xuan ^{[1
]}

Yue, Guang-Hui ^{[1
]}

Chen, Yuanzhi ^{[1
]}

Peng, Dong-Liang ^{[1
]}

机构：

[1] Xiamen Univ, Dept Mat Sci & Engn, Coll Mat, Xiamen 361005, Peoples R China

来源：

JOURNAL OF ALLOYS AND COMPOUNDS | 2010年 / 508卷 / 02期

基金：

美国国家科学基金会;

关键词：

Nanostructures; Thin films; Sputtering; Mechanical properties; High transparency; ZINC-OXIDE FILMS; TRANSPARENT; DEPENDENCE;

D O I：

10.1016/j.jallcom.2010.08.034

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The Al-doped zinc oxide (ZnO:Al) films were prepared on quartz glass flakes and silicon wafers by radio frequency (RF) magnetron sputtering which uses an aluminum-doped zinc oxide ceramic target. Meanwhile, their properties were characterized by scanning electron microscopy, X-ray diffraction, infrared-UV spectrophotometry, resistance measurement, nano-scratch and indentation test. Evolutions of the structural, optical, electrical and mechanical properties of the ZnO:Al films as a function of substrate temperatures ranging from room temperature to 400 degrees C were analyzed. The results indicate that the ZnO:Al films with a low resistivity value of 4.97 x 10(-4) Omega cm, a relatively higher adhesion and a high transparency above 90%, can be prepared at a substrate temperature of 400 degrees C. (C) 2010 Elsevier B.V. All rights reserved.

引用

页码：370 / 374

页数：5

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