Excitation to defect-bound band edge states in two-dimensional semiconductors and its effect on carrier transport

被引:30
作者
Wang, Dan [1 ]
Han, Dong [2 ]
West, Damien [3 ]
Chen, Nian-Ke [1 ]
Xie, Sheng-Yi [1 ]
Tian, Wei Quan [4 ]
Meunier, Vincent [3 ]
Zhang, Shengbai [1 ,3 ]
Li, Xian-Bin [1 ,3 ]
机构
[1] Jilin Univ, Coll Elect Sci & Engn, State Key Lab Integrated Optoelect, Changchun 130012, Jilin, Peoples R China
[2] Chinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, State Key Lab Luminescence & Applicat, Changchun 130033, Jilin, Peoples R China
[3] Rensselaer Polytech Inst, Dept Phys Appl Phys & Astron, Troy, NY 12180 USA
[4] Chongqing Univ, Coll Chem & Chem Engn, Huxi Campus, Chongqing 401331, Peoples R China
基金
中国国家自然科学基金;
关键词
TOTAL-ENERGY CALCULATIONS; MOS2;
D O I
10.1038/s41524-018-0145-0
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The ionization of dopants is a crucial process for electronics, yet it can be unexpectedly difficult in two-dimensional materials due to reduced screening and dimensionality. Using first-principles calculations, here we propose a dopant ionization process for two-dimensional semiconductors where charge carriers are only excited to a set of defect-bound band edge states, rather than to the true band edge states, as is the case in three-dimensions. These defect-bound states have small enough ionization energies but large enough spatial delocalization. With a modest defect density, carriers can transport through band by such states.
引用
收藏
页数:6
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