Extraction of a low-current discharge from a microplasma for nanoscale patterning applications at atmospheric pressure

被引：8

作者：

Lee, Seung Whan ^{[1
]}

Zamani, Hamidreza ^{[2
]}

Feng, Philip X. -L. ^{[2
]}

Sankaran, R. Mohan ^{[1
]}

机构：

[1] Case Western Reserve Univ, Dept Chem Engn, Cleveland, OH 44106 USA

[2] Case Western Reserve Univ, Dept Elect Engn & Comp Sci, Cleveland, OH 44106 USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2012年 / 30卷 / 01期

关键词：

CHEMICAL REDUCTION METHOD; BEAM-INDUCED DEPOSITION; PLASMA; NANOPARTICLES; PLATINUM; FILMS;

D O I：

10.1116/1.3669523

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The authors present a scheme to extract a low-current discharge from a microplasma at atmospheric pressure for nanopatterning applications. The extracted discharge is generated by applying a high positive voltage to an independent electrode and accelerating electrons from the microplasma. Current-voltage (I-V) characteristics of the extracted discharge show high stability at low currents and tunability over a wide range of currents. Exposure of metal precursor loaded films to the extracted discharge results in electrochemical reduction of metal ions to solid metal, as confirmed by X-ray photoelectron spectroscopy. Combining this approach with masking techniques allows the transfer of nanoscale patterns of metal at ambient conditions. (C) 2012 American Vacuum Society. [DOI: 10.1116/1.3669523]

引用

页数：5

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