Deposited carbon distributions on nickel film/oxide substrate systems

被引:26
作者
Yoshinaga, Masashi [1 ]
Kishimoto, Haruo [1 ]
Yamaji, Katsuhiko [1 ]
Xiong, Yue-Ping [1 ]
Brito, Manuel E. [1 ]
Horita, Teruhisa [1 ]
Yokokawa, Harumi [1 ,2 ]
机构
[1] Natl Inst Adv Ind Sci & Technol, Tsukuba, Ibaraki 3058565, Japan
[2] Tokyo City Univ, Setagaya Ku, Tokyo 1580082, Japan
关键词
Carbon deposition; Micro-Raman spectroscopy; Yttria stabilized zirconia (YSZ); Scandia stabilized zirconia (ScSZ); Gadolinia doped ceria (GDC); SOFC; Anode; Nickel based-cermet; ANODES; PERFORMANCE; SOFC; CH4;
D O I
10.1016/j.ssi.2010.05.003
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Distribution of deposited carbon at early stage is investigated by micro-Raman spectroscopy. Model samples consisting of nickel films sputtered on oxide substrates were used. Carbon deposition treatment was carried out for three nickel/oxide systems: Ni/YSZ (Yttria Stabilized Zirconia), Ni/ScSZ (Scandia Stabilized Zirconia), and Ni/GDC (Gadolinia doped ceria) at 873 K under dry 4.9% CH4/Ar gas. Significant carbon deposition was observed on the nickel surfaces for both Ni/YSZ and Ni/ScSZ. No carbon was observed on the nickel surfaces of Ni/GDC system. According to Raman spectra, the deposited carbon bonding state was similar between Nil YSZ and Ni/ScSZ systems and it correspond to a graphitic phase. (C) 2010 Elsevier B.V. All rights reserved.
引用
收藏
页码:571 / 575
页数:5
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