Hysteretic I-V characteristics of the SrZrO3 (SZO) thin films with various Mo-doping concentrations were investigated in the study. The 0.2 mol% Mo-doping SZO-based memory device showed excellent resistive switching characteristics, and the resistive switching can be operated over 300 times during successive operation. Both high and low conductive states were stable over 10(4) s. Multi-bit behavior was investigated by dc voltage sweeping with different spans of voltage scan for OFF-process and by various OFF-pulse voltages as well. The endurance test can be over 1000 times with no data loss found. The experimental results showed high potential for nonvolatile memory application. (c) 2007 Published by Elsevier B.V.
机构:
Korea Inst Sci & Technol, Thin Film Mat Res Ctr, Seoul 136791, South KoreaKorea Inst Sci & Technol, Thin Film Mat Res Ctr, Seoul 136791, South Korea
机构:
Natl Inst Adv Ind Sci & Technol, Correlated Electron Res Ctr, Tsukuba, Ibaraki 3058562, JapanNatl Inst Adv Ind Sci & Technol, Correlated Electron Res Ctr, Tsukuba, Ibaraki 3058562, Japan
Sawa, A
论文数: 引用数:
h-index:
机构:
Fujii, T
Kawasaki, M
论文数: 0引用数: 0
h-index: 0
机构:Natl Inst Adv Ind Sci & Technol, Correlated Electron Res Ctr, Tsukuba, Ibaraki 3058562, Japan
机构:
Korea Inst Sci & Technol, Thin Film Mat Res Ctr, Seoul 136791, South KoreaKorea Inst Sci & Technol, Thin Film Mat Res Ctr, Seoul 136791, South Korea
机构:
Natl Inst Adv Ind Sci & Technol, Correlated Electron Res Ctr, Tsukuba, Ibaraki 3058562, JapanNatl Inst Adv Ind Sci & Technol, Correlated Electron Res Ctr, Tsukuba, Ibaraki 3058562, Japan
Sawa, A
论文数: 引用数:
h-index:
机构:
Fujii, T
Kawasaki, M
论文数: 0引用数: 0
h-index: 0
机构:Natl Inst Adv Ind Sci & Technol, Correlated Electron Res Ctr, Tsukuba, Ibaraki 3058562, Japan