Low energy ion beams by laser interaction

被引:8
作者
Lorusso, A. [1 ]
Siciliano, M. V. [1 ,3 ]
Velardi, L. [1 ,2 ]
Nassisi, V. [1 ]
机构
[1] Univ Salento, Dept Phys, Lab Elettron Appl & Strumentaz LEAS, I-73100 Lecce, Italy
[2] Univ Bari, Dept Phys, I-70126 Bari, Italy
[3] Univ Salento, Dept Mat Sci, I-73100 Lecce, Italy
来源
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 2010年 / 101卷 / 01期
关键词
EXCIMER-LASER; PLASMA; IMPLANTATION;
D O I
10.1007/s00339-010-5793-y
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We developed an ion accelerator with a double accelerating gap system supplied by two power generators of different polarity. The ions were generated by laser ion source technique. The laser plasma induced by an excimer KrF laser, freely expanded before the action of accelerating fields. After the first gap action, the ions were again accelerated by a second gap. The total acceleration can imprint a maximum ion energy up to 160 keV per charge state. We analysed the extracted charge from a Cu target as a function of the accelerating voltage at laser energy of 9, 11 and 17 mJ deposited on a spot of 0.005 cm(2). The peak of current density was 3.9 and 5.3 mA for the lower and medium laser energy at 60 kV. At the highest laser energy, the maximum output current was 11.7 mA with an accelerating voltage of 50 kV. The maximum ion dose was estimated to be 10(12) ions/cm(2). Under the condition of 60 kV accelerating voltage and 5.3 mA output current the normalized emittance of the beam measured by pepper pot method was 0.22 pi mm mrad.
引用
收藏
页码:179 / 183
页数:5
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