Elemental sensitivity in soft x-ray imaging with a laser-plasma source and a color center detector

被引：26

作者：

Calegari, F.

Valentini, G.

Vozzi, C.

Benedetti, E.

Cabanillas-Gonzalez, J.

Faenov, A.

Gasilov, S.

Pikuz, T.

Poletto, L.

Sansone, G.

Villoresi, P.

Nisoli, M.

De Silvestri, S.

Stagira, S. ^{[1
]}

机构：

[1] CNR, INFM, Natl Lab Ultrafast & Ultraintense Opt Sci, Milan, Italy

[2] Kansai Photon Sci Inst, Japan Atom Energy Agcy, Kyoto, Japan

[3] Joint Inst High Temp, RAS, Moscow, Russia

[4] Univ Padua, CNR, INFM, Lab Ultraviolet & X Ray Opt Res, Padua, Italy

来源：

OPTICS LETTERS | 2007年 / 32卷 / 17期

关键词：

Lithium compounds - Optical sensors - Plasma sources - Thin films - Ultrafast phenomena;

D O I：

10.1364/OL.32.002593

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Elemental sensitivity in soft x-ray imaging of thin foils with known thickness is observed using an ultrafast laser-plasma source and a LiF crystal as detector. Measurements are well reproduced by a simple theoretical model. This technique can be exploited for high spatial resolution, wide field of view imaging in the soft x-ray region, and it is suitable for the characterization of thin objects with thicknesses ranging from hundreds down to tens of nanometers. (c) 2007 Optical Society of America.

引用

页码：2593 / 2595

页数：3

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