The growth of bismuth-based cubic pyrochlore dielectric thin films

被引：7

作者：

Gao, Libin ^{[1
,2
,3
]}

Liang, Kexin ^{[1
,2
,3
]}

Guan, Zhipu ^{[1
,2
,3
]}

Huang, Shixian ^{[1
,2
,3
]}

Chen, Hongwei ^{[1
,2
,3
]}

Zhang, Jihua ^{[1
,2
,3
]}

机构：

[1] Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Peoples R China

[2] Univ Elect Sci & Technol China, Collaborat Innovat Ctr Elect Mat & Devices, Chengdu 610054, Peoples R China

[3] Univ Elect Sci & Technol China, Sch Elect Sci & Engn, Chengdu 610054, Peoples R China

来源：

CERAMICS INTERNATIONAL | 2019年 / 45卷 / 02期

基金：

中国国家自然科学基金;

关键词：

Cubic pyrochlore films; Tunability; Low loss; Thin film deposition technologies; PULSED-LASER DEPOSITION; ELECTRICAL-PROPERTIES; MICROWAVE PROPERTIES; SUBSTRATE-TEMPERATURE; DOPED CONCENTRATION; TUNABLE PROPERTIES; OPTICAL-PROPERTIES; EPITAXIAL-GROWTH; OXYGEN-PRESSURE; BST;

D O I：

10.1016/j.ceramint.2018.10.094

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Bismuth-based cubic pyrochlore thin films, such as Bi1.5ZnNb1.5O7 (BZN) and Bi1.5MgNb1.5O7 (BMN) thin films show attractive properties for microwave tunable system due to their medium dielectric constant, low dielectric loss, and high dielectric tunability. Several deposition technologies are used for preparing bismuth-based cubic pryochlore thin films. The effects of different thin film deposition approaches on the structure and dielectric properties of BZN/BMN thin films are summarized. The advantages and limitations of bismuth-based cubic pyrochlore thin films deposited by different deposition technologies are also discussed from the viewpoint of dielectric properties.

引用

页码：1482 / 1495

页数：14

共 105 条

[1] Tunability and Calculation of the Dielectric Constant of Capacitor Structures with Interdigital Electrodes [J].