Field-based Simulations of Directed Self-Assembly in a Mixed Brush System

Self-assembling block copolymer thin films have attracted considerable attention as a promising high resolution lithographic tool due to the 10 nm scale of microdomain ordering and their facility for modulation of size and pattern. However, for block copolymer lithography to be a viable solution for advanced nano-lithographic technologies, several critical requirements need to be satisfied. Our research has focused on developing complementary mixed polymer brush lithography tools satisfying the required criteria, by means of Self-Consistent Field Theory (SCFT) simulations. Specifically, we have concentrated on graphoepitaxial techniques that are widely tested and considered a particularly promising method for controlling the microdomain ordering.