Field-based Simulations of Directed Self-Assembly in a Mixed Brush System

被引：1
|
作者：
Hur, Su-Mi [1 ,2 ]
Frischknecht, Amalie L. [3 ]
Huber, Dale [3 ]
Fredrickson, Glenn H. [1 ,2 ]
机构：
[1] Univ Calif Santa Barbara, Mat Res Lab, Santa Barbara, CA 93106 USA
[2] Univ Calif Santa Barbara, Dept Chem Engn, Santa Barbara, CA 93106 USA
[3] Sandia Natl Labs, Albuquerque, NM 87185 USA
来源：
ALTERNATIVE LITHOGRAPHIC TECHNOLOGIES II | 2010年 / 7637卷
基金：
美国能源部;
关键词：
Mixed brush; Self-Consistent Field Theory (SCFT); graphoepitaxy; grafting density; directed self-assembly; BLOCK-COPOLYMER;
D O I：
10.1117/12.848416
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Self-assembling block copolymer thin films have attracted considerable attention as a promising high resolution lithographic tool due to the 10 nm scale of microdomain ordering and their facility for modulation of size and pattern. However, for block copolymer lithography to be a viable solution for advanced nano-lithographic technologies, several critical requirements need to be satisfied. Our research has focused on developing complementary mixed polymer brush lithography tools satisfying the required criteria, by means of Self-Consistent Field Theory (SCFT) simulations. Specifically, we have concentrated on graphoepitaxial techniques that are widely tested and considered a particularly promising method for controlling the microdomain ordering.
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页数：5
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