CRYSTALLIZATION BEHAVIOR OF VAPOR-DEPOSITED HEXANITROAZOBENZENE (HNAB) FILMS

被引：2
|
作者：
Knepper, R. [1 ]
Tappan, A. S. [1 ]
Rodriguez, M. A. [1 ]
Alam, M. K. [1 ]
Martin, L. [1 ]
Marquez, M. P. [1 ]
机构：
[1] Sandia Natl Labs, Albuquerque, NM 87185 USA
来源：
SHOCK COMPRESSION OF CONDENSED MATTER - 2011, PTS 1 AND 2 | 2012年 / 1426卷
关键词：
Physical vapor deposition; crystallization;
D O I：
10.1063/1.3686588
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Vapor-deposited hexanitroazobenzene (HNAB) has been shown to form an amorphous structure as-deposited that crystallizes over a period ranging from several hours to several weeks, depending on the ambient temperature. Raman spectroscopy and x-ray diffraction were used to identify three distinct phases during the crystallization process: the as-deposited amorphous structure, the HNAB-II crystal structure, and an as-yet unidentified crystal structure. Significant qualitative differences in the nucleation and growth of the crystalline phases were observed between 65 degrees C and 75 degrees C. While the same two polymorphs form in all cases, significant variation in the quantities of each phase was observed as a function of temperature.
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页数：4
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