Low temperature deposition of indium tin oxide (ITO) films on plastic substrates

被引:0
作者
Singh, V [1 ]
Saswat, B [1 ]
Kumar, S [1 ]
机构
[1] Indian Inst Technol, Samtel Ctr Display Technol, Kanpur 208016, Uttar Pradesh, India
来源
Materials, Integration and Technology for Monolithic Instruments | 2005年 / 869卷
关键词
ITO; OLED; plastic substrate and magnetron sputtering;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Organic light emitting diodes (OLEDs) require a transparent conducting oxide (TCO) electrode for injection of charge carriers and the emitted light to come out. In order to exploit the full flexibility of organic semiconductor based large area electronic devices, the deposition of TCO on plastic substrates is essential, which prohibits high temperature processing. Therefore, low temperature deposition of Indium tin oxide (ITO) films is very important for flat panel displays and solar cells. Here we have carried out a systematic study of ITO deposition on plastic substrates using RF magnetron sputtering. For the optimization of structural, electrical and optical properties of ITO, various experiments such as X-ray diffractometer, transmission measurements, sheet resistance and AFM were employed. These properties were investigated as a function of substrate temperature, deposition time and RF power. From these experiments, we obtained a reasonably low sheet resistance (similar to 14 Omega/square) and high transmittance (similar to 75%) in the visible region on plastic substrates. We also observed that these films are not much affected by atmosphere and does not degrade with time. These ITO films deposited by RF magnetron sputtering on plastic substrates can be use as anode for flexible organic light emitting displays.
引用
收藏
页码:139 / 144
页数:6
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