Thermal characterization and analysis of phase change random access memory

被引:67
作者
Giraud, V
Cluzel, J
Sousa, V
Jacquot, A [1 ]
Dauscher, A
Lenoir, B
Scherrer, H
Romer, S
机构
[1] Univ Henri Poincare, Ecole Natl Super Mines, Inst Natl Polytech Lorraine, CNRS,UMR 7556,Lab Phys Mat, F-54042 Nancy, France
[2] Commissariat Energie Atom, CEA, DRT, LETI, F-38054 Grenoble, France
[3] Swiss Fed Lab Mat Testing & Res, EMPA, Dept 125, Eidgenoss Mat Prufungs, CH-8600 Dubendorf, Switzerland
[4] Swiss Fed Lab Mat Testing & Res, Forsch Anstalt, CH-8600 Dubendorf, Switzerland
关键词
D O I
10.1063/1.1944910
中图分类号
O59 [应用物理学];
学科分类号
摘要
The cross-plane thermal conductivity of Ge2Sb2Te5, either in its amorphous state or fcc crystallized state, and titanium nitride (TiN) thin films has been measured at room temperature by the 3 omega method. These materials are involved in the fabrication of phase change random access memory (PC-RAM), Ge2Sb2Te5 and TiN being the PC and pseudoelectrode materials, respectively. The thermal conductivity of insulating SiO2 and ZnS: SiO2 layers was determined too. Each thermal conductivity measurement was performed by the means of at least two strip widths in order to check both the measurement self-consistency and the measurement accuracy. The performance of PC-RAM cells, i.e., the time needed to reach the melting temperature of the PC material and the cooling speed, has been evaluated as a function of both the measured thermal conductivity of the PC material and the reset cur-rent intensity independently of the thermal properties of the pseudoelectrodes by the way of analytical formula. The influence of the thickness and the thermal properties of the pseudoelectrodes on the performances have been determined by numerical simulations. (c) 2005 American Institute of Physics.
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页数:7
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