Atomic force microscope nanofabrication of InAs/AlGaSb heterostructures

被引:17
作者
Sasa, S [1 ]
Ikeda, T [1 ]
Dohno, C [1 ]
Inoue, M [1 ]
机构
[1] Osaka Inst Technol, Dept Elect Engn, Asahi Ku, Osaka 535, Japan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 1997年 / 36卷 / 6B期
关键词
InAs/AlGaSb; AFM oxidation; nanofabrication; magnetoresistance;
D O I
10.1143/JJAP.36.4065
中图分类号
O59 [应用物理学];
学科分类号
摘要
We employ an atomic force microscope (AFM) for the fabrication of InAs/Al(Ga)Sb nanostructures. In order to make nanoscale modifications in the two-dimensional electron gas (2DEG) system, we apply an AFM oxidation process for GaSb, for the first time. We found that the oxidation of GaSb occurs for tip voltages over 7-8 V and that the oxidized GaSb region can be selectively removed by immersion in water for 10 min. We successfully fabricate a lateral periodic structure on the GaSb cap layer using AFM oxidation with a 0.3 mu m spacing. The induced increase in the 2DEG concentration is as high as 80% due to the surface modification. The magnetotransport measurement also implies structural modification of the 2DEG system.
引用
收藏
页码:4065 / 4067
页数:3
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