Structural and Thermoelectric Properties of Nanocrystalline Bismuth Telluride Thin Films Under Compressive and Tensile Strain

被引:41
作者
Kusagaya, K. [1 ]
Hagino, H. [2 ]
Tanaka, S. [3 ]
Miyazaki, K. [2 ]
Takashiri, M. [1 ]
机构
[1] Tokai Univ, Dept Mat Sci, Hiratsuka, Kanagawa 2591292, Japan
[2] Kyushu Inst Technol, Dept Mech & Control Engn, Tobata Ku, Kitakyushu, Fukuoka 8048550, Japan
[3] Nihon Univ, Dept Mech Engn, Coll Engn, Koriyama, Fukushima 9638642, Japan
关键词
Nanocrystalline; bismuth telluride; thin films; compressive strain; tensile strain; FLASH EVAPORATION METHOD; ELECTRONICS; FABRICATION; TRANSISTORS; IMPROVEMENT; DEVICES; MERIT;
D O I
10.1007/s11664-014-3496-4
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
To investigate the effect of strain on bismuth telluride films, we applied different compressive and tensile strains to thin films by changing the bending radius of a flexible substrate so the strain ranged from -0.3% (compressive) to +0.3% (tensile). The structural properties of the strained thin films, composed of nanosized grains, were analyzed by x-ray diffraction and scanning electron microscopy. For all samples the main peak was the (015) diffraction peak; crystal orientation along the (015) growth direction was slightly enhanced by application of compressive strain. The thermoelectric properties of strained bismuth telluride thin films were evaluated by measurement of electrical conductivity, Seebeck coefficient, and power factor. The magnitude and direction of the applied strain did not significantly affect the power factor, because when the strain changed from compressive to tensile the electrical conductivity increased and the absolute Seebeck coefficient decreased.
引用
收藏
页码:1632 / 1636
页数:5
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