Solvent induced shape recovery of shape memory polymer based on chemically cross-linked poly(vinyl alcohol)
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作者:
Du, Haiyan
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Sichuan Univ, State Key Lab Polymer Mat & Engn China, Polymer Res Inst, Chengdu 610065, Peoples R ChinaSichuan Univ, State Key Lab Polymer Mat & Engn China, Polymer Res Inst, Chengdu 610065, Peoples R China
Du, Haiyan
[1
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Zhang, Junhua
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Sichuan Univ, State Key Lab Polymer Mat & Engn China, Polymer Res Inst, Chengdu 610065, Peoples R ChinaSichuan Univ, State Key Lab Polymer Mat & Engn China, Polymer Res Inst, Chengdu 610065, Peoples R China
Zhang, Junhua
[1
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机构:
[1] Sichuan Univ, State Key Lab Polymer Mat & Engn China, Polymer Res Inst, Chengdu 610065, Peoples R China
A shape memory polymer based on poly(vinyl alcohol) (SM-PVA) chemically cross-linked with glutaraldehyde exhibits good temperature responsive shape memory behavior. In the present investigation, solvent-induced shape memory behavior is observed by immersing this kind of SM-PVA in good or poor solvents (including water, DMF, and EG etc.) for PVA. A significant indication of shape memory is the decrease of the glass transition temperature (T-g), which is caused by PVA swelling in certain solvents. Differential scanning calorimetry (DSC), dynamic mechanical analysis (DMA), swelling equilibrium and bending tests are carried out to find the mechanism behind this interesting phenomenon. Factors that influence the permeation of solvents in the polymer depend on the rate and degree of swelling and whether swelling will occur, which determines the shape recovery ratio in different solvents. Water can induce shape recovery in a shorter time than organic solvents. The structure of water and PVA, and the interaction between them, contribute to the shorter recovery time. SM-PVA has an excellent shape recovery ratio even after several test cycles. Using solvents as a stimulus for shape memory behavior will extend applications of SMPs, especially in the field of medical devices, where stimulus instead of heat is highly desired.
机构:
Tohoku Univ, Dept Nanomech, Aoba Ku, Sendai, Miyagi 9808579, JapanTohoku Univ, Dept Nanomech, Aoba Ku, Sendai, Miyagi 9808579, Japan
Nishikawa, Masaaki
Wakatsuki, Ken
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Univ Tokyo, Dept Aeronaut & Astronaut, Kashiwa, Chiba 2778561, JapanTohoku Univ, Dept Nanomech, Aoba Ku, Sendai, Miyagi 9808579, Japan
Wakatsuki, Ken
Yoshimura, Akinori
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Japan Aerosp Explorat Agcy JAXA, Adv Composite Grp, Aerosp Res & Dev Directorate ARD, Mitaka, Tokyo 1810015, JapanTohoku Univ, Dept Nanomech, Aoba Ku, Sendai, Miyagi 9808579, Japan
Yoshimura, Akinori
Takeda, Nobuo
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Univ Tokyo, Dept Adv Energy, Kashiwa, Chiba 2778561, JapanTohoku Univ, Dept Nanomech, Aoba Ku, Sendai, Miyagi 9808579, Japan