An embedded atom approach to underpotential deposition phenomena

被引:37
作者
Sánchez, CG [1 ]
Del Pópolo, MG [1 ]
Leiva, EPM [1 ]
机构
[1] Univ Nacl Cordoba, Fac Ciencias Quim, Unidad Matemat & Fis, RA-5000 Cordoba, Argentina
关键词
adsorption; embedded atom method; monolayer; underpotential deposition;
D O I
10.1016/S0039-6028(98)00818-8
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We have performed embedded atom calculations for a number of systems of electrochemical interest involving a metallic single-crystal substrate and a metallic adsorbate. Different thermodynamic contributions to the so-called underpotential shift are calculated and analyzed comparatively, drawing some general trends. The metal pairs considered involve silver, gold, platinum, palladium and copper. We consider the possibility of underpotential deposition through the excess of binding energy, arriving at two novel conclusions. First, for some systems consisting of metal M(1) and M(2), underpotential deposition should be energetically possible in both cases, that is M(1) on M(2) and M(2) on M(1). Second, anions may play a decisive role in changing the energetics of some systems. In particular cases like copper on Au(lll) they may be responsible to a large extent for the existence of an underpotential deposition. Entropic contributions were neglected in the present analysis. (C) 1999 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:59 / 72
页数:14
相关论文
共 41 条