Low temperature synthesis of single-walled carbon nanotubes in an inductively coupled plasma chemical vapor deposition system

被引:5
|
作者
Weng, Cheng-Hui [1 ]
Yang, Chao-Shun [1 ]
Lin, Hsuan [1 ]
Tsai, Chuen-Horng [1 ]
Leou, Keh-Chyang [1 ]
机构
[1] Natl Tsing Hua Univ, Dept Engn & Syst Sci, Hsinchu 30013, Taiwan
关键词
single-walled carbon nanotubes; plasma-enhanced chemical vapor deposition (PECVD); low temperature; bi-layered dry catalysts;
D O I
10.1166/jnn.2008.535
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
In this work, we present a parametric study on the low temperature synthesis of single-walled carbon nanotubes (SWNTs) in an inductively coupled plasma (ICP) CVD system using dry bi-layered catalytic thin-films (Fe/Al and Ni/Al, deposited by electron-beam evaporation method) as the catalysts. With a low substrate temperature of 550 degrees C and above, SWNTs were successfully synthesized on both catalysts, as revealed from the characteristic peaks of SWNTs in the micro-Raman spectra. By the reduction of plasma power and the shortening of the process times, the lowest synthesis temperature of SWNTs achieved in our system was approached to 500 degrees C on Ni/Al catalysts; on the other hands, the lowest temperature for Fe/Al catalysts was 550 degrees C. Our results suggest that as compared with Fe/Al, Ni/Al is more favorable for plasma-enhanced CVD (PECVD) synthesis of SWNTs at low temperatures. This work can be used for further improvements and better understanding on the production processes of SWNTs by PECVD methods.
引用
收藏
页码:2526 / 2533
页数:8
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