Numerical modeling of pulsed laser evaporation of aluminum targets

被引:42
作者
Jeong, SH
Greif, R
Russo, RE [1 ]
机构
[1] Univ Calif Berkeley, Lawrence Berkeley Lab, Berkeley, CA 94720 USA
[2] Univ Calif Berkeley, Dept Mech Engn, Berkeley, CA 94720 USA
关键词
pulsed laser evaporation; laser ablation; Knudsen layer;
D O I
10.1016/S0169-4332(97)00629-6
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
A one dimensional thermal model was used to investigate the pulsed laser evaporation of aluminum targets. The gasdynamic flow of the vapor was predicted by solving one dimensional compressible flow equations for an inviscid fluid. The variation of the threshold laser fluence for target evaporation with respect to target surface reflectivity was investigated. The threshold laser fluence predicted by a thermal evaporation model was larger than the values obtained experimentally. The effects of the ambient pressure and the laser fluence on the local Mach number of the vapor at the edge of the Knudsen layer were studied. The structure of the gasdynamic flow including the shock wave and the contact surface was shown in the density profiles. (C) 1998 Elsevier Science B.V.
引用
收藏
页码:177 / 183
页数:7
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