ENERGY EFFICIENCY OF FEMTOSECOND LASER ABLATION OF POLYMER MATERIALS

被引：9
作者：
Loktionov, E. Yu. [1 ]
Ovchinnikov, A. V. [2 ]
Protasov, Yu. Yu. [1 ]
Protasov, Yu. S. [1 ]
Sitnikov, D. S. [2 ]
机构：
[1] NE Bauman Moscow State Tech Univ, Moscow 105005, Russia
[2] Russian Acad Sci, Joint Inst High Temp, Moscow 117901, Russia
来源：
JOURNAL OF APPLIED SPECTROSCOPY | 2012年 / 79卷 / 01期
关键词：
femtosecond laser pulses; laser ablation; spectral energy thresholds; ablated mass; polymers; polytetrafluoroethylene; polyoxymethylene; THIN-FILMS; POLYTETRAFLUOROETHYLENE TEFLON; YAG LASER; DEPOSITION; THRESHOLD; PLASMA; PULSES; PTFE; POLY(TETRAFLUOROETHYLENE); DEFLECTION;
D O I：
10.1007/s10812-012-9570-x
中图分类号：
O433 [光谱学];
学科分类号：
0703 ; 070302 ;
摘要：
We present the results of an experimental study of the ablation spectral energy thresholds for a number of polymer materials ((C2F4)(n), (CH2O)(n)) exposed to femtosecond (tau(0.5) similar to 45-70 fs) laser pulses (lambda similar to 266, 400, 800 nm) under atmospheric conditions and under vacuum (p similar to 10(-2) Pa). We have analyzed the energy thresholds and the efficiency of optical, thermophysical, and gasdynamic processes in laser ablation vs. the laser pulse duration and photon energy.
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页码：104 / 112
页数：9
相关论文
共 54 条
  • [1] Femtosecond ultraviolet (248 nm) excimer laser processing of Teflon (PTFE)
    Adhi, KP
    Owings, RL
    Railkar, TA
    Brown, WD
    Malshe, AP
    [J]. APPLIED SURFACE SCIENCE, 2003, 218 (1-4) : 17 - 23
  • [2] DEPOSITION OF AMORPHOUS FLUOROPOLYMERS THIN-FILMS BY LASER ABLATION
    BLANCHET, GB
    [J]. APPLIED PHYSICS LETTERS, 1993, 62 (05) : 479 - 481
  • [3] ULTRAVIOLET PHOTOABLATION OF A PLASMA-SYNTHESIZED FLUOROCARBON POLYMER
    BRANNON, JH
    SCHOLL, D
    KAY, E
    [J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1991, 52 (02): : 160 - 166
  • [4] SOME PROPERTIES OF PLASMAS PRODUCED BY IRRADIATING LIGHT SOLIDS BY LASER PULSES
    CARUSO, A
    GRATTON, R
    [J]. PLASMA PHYSICS, 1968, 10 (09): : 867 - &
  • [5] Plasma and ablation dynamics in ultrafast laser processing of crystalline silicon
    Choi, TY
    Grigoropoulos, CP
    [J]. JOURNAL OF APPLIED PHYSICS, 2002, 92 (09) : 4918 - 4925
  • [6] LASER-ABLATION OF POLYMERIC MATERIALS AT 157 NM
    COSTELA, A
    GARCIAMORENO, I
    FLORIDO, F
    FIGUERA, JM
    SASTRE, R
    HOOKER, SM
    CASHMORE, JS
    WEBB, CE
    [J]. JOURNAL OF APPLIED PHYSICS, 1995, 77 (06) : 2343 - 2350
  • [7] NEUTRAL AND ION EMISSIONS ACCOMPANYING PULSED EXCIMER-LASER IRRADIATION OF POLYTETRAFLUOROETHYLENE
    DICKINSON, JT
    SHIN, JJ
    JIANG, W
    NORTON, MG
    [J]. JOURNAL OF APPLIED PHYSICS, 1993, 74 (07) : 4729 - 4736
  • [8] DOPANT-INDUCED EXCIMER LASER ABLATION OF POLY(TETRAFLUOROETHYLENE) .2. EFFECT OF DOPANT CONCENTRATION
    EGITTO, FD
    DAVIS, CR
    [J]. APPLIED PHYSICS B-PHOTOPHYSICS AND LASER CHEMISTRY, 1992, 55 (06): : 488 - 493
  • [9] Elbandrawy M. A. K. A., 2006, THESIS OLD DOMINION
  • [10] MEASUREMENTS OF CHARGED-PARTICLES IN THE LASER-ABLATION PLUME OF POLYMERS
    FUJII, T
    INOUE, S
    KANNARI, F
    [J]. JOURNAL OF APPLIED PHYSICS, 1995, 78 (05) : 3401 - 3407
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