Improved understanding of physical defect mechanisms using fault simulation

被引:0
作者
Garyet, TC
Dickson, N
机构
[1] Motorola Inc., Microprocessor Memory Technol. Grp., Austin, TX 78735
来源
MICROELECTRONICS AND RELIABILITY | 1997年 / 37卷 / 01期
关键词
D O I
10.1016/0026-2714(96)00244-2
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Failure mechanisms in highly integrated designs are becoming more subtle, making them difficult to locate and understand. Successful analysis requires the precise location of the anomaly in three dimensions, prior to physical analysis, when strip and inspect techniques do not yield a failure mechanism. This paper presents a technique whereby simulations of hypothesized defects, in combination with I-V curves obtained by electrical microprobing, aid in locating physical defects. Given the exact location, techniques requiring that the physical and chemical sample integrity be maintained, such as TEM and AES, can be employed to give insight into the failure mechanism. Copyright (C) 1996 Elsevier Science Ltd
引用
收藏
页码:121 / 135
页数:15
相关论文
共 2 条
[1]  
ERINGTON K, 1992, ISTFA 92 : PROCEEDINGS OF THE 18TH INTERNATIONAL SYMPOSIUM FOR TESTING AND FAILURE ANALYSIS, P229
[2]  
WILLS KS, 1992, ISTFA 92 : PROCEEDINGS OF THE 18TH INTERNATIONAL SYMPOSIUM FOR TESTING AND FAILURE ANALYSIS, P79