Temperature-dependent Hall study on p-type GaN epilayers grown by metal-organic chemical vapor deposition

被引:0
作者
Wang, W [1 ]
Liu, W [1 ]
Hao, MS [1 ]
Chua, SJ [1 ]
Liu, R [1 ]
机构
[1] Inst Mat Res & Engn, Singapore 117602, Singapore
来源
PROCEEDINGS OF THE INTERNATIONAL WORKSHOP ON NITRIDE SEMICONDUCTORS | 2000年 / 1卷
关键词
Hall Measurement; GaN; MOCVD; p-type doping; hole mobility; scattering factors;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Temperature-dependent Hall measurements were performed on p-type GaN epilayers grown on (0001) sapphire substrates by metal-organic chemical vapor deposition in the temperature range of 100 K to 500 K. The resistivity, hole concentration and hole mobility were monitored as a function of temperature. By analyzing the temperature dependence of these electrical properties, the activation energies of 156 meV and 149 meV were obtained for the relatively low p-conductive samples and highly p-conductive samples, respectively. Also conduction mechanisms were found to be free carrier conductions contributed from Mg acceptors for relatively low p-conductive samples (p=3x 10(17)cm(-3) at room temperature) at all temperatures and for highly p-conductive samples (p=1.2x10(18)cm(-3) at room temperature) at high temperature. At low temperature, impurity-band conduction must also be involved when doping concentration is high. Finally scattering factors limiting hole mobility were discerned at different temperatures.
引用
收藏
页码:736 / 739
页数:4
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