Dependence of Semiconductor to Metal Transition of VO2(011)/NiO{100}/MgO{100}/TiN{100}/Si{100} Heterostructures on Thin Film Epitaxy and Nature of Strain

被引:6
作者
Bayati, Reza [1 ]
Molaei, Roya [2 ]
Wu, Fan [3 ]
Narayan, Jagdish [3 ]
Yarmolenko, Sergey [4 ]
机构
[1] Intel Corp, IMO RA, Hillsboro, OR 97124 USA
[2] Intel Corp, Hillsboro, OR 97124 USA
[3] Princeton Univ, Princeton Inst Sci & Technol Mat PRISM, Princeton, NJ 08540 USA
[4] N Carolina Agr & Tech State Univ, NSF ERC Ctr Revolutionizing Metall Biomat, Greensboro, NC 27411 USA
基金
美国国家科学基金会;
关键词
INSULATOR-TRANSITION; MISFIT DISLOCATIONS; PHASE-TRANSITION; VO2; LASER; EXCITATION; GROWTH;
D O I
10.1111/jace.13454
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We have studied semiconductor to metal transition (SMT) characteristics of VO2(011) thin films integrated epitaxially with Si(100) through NiO{001}/MgO{001}/TiN{001} buffer layers and correlated with the details of epitaxy and nature of residual stresses and strains across the VO2/NiO interface. Thin film epitaxy at both room and elevated temperatures is studied in detail by electron microscopy and in situ high-temperature X-ray diffraction techniques. The epitaxial relationship across the interface between monoclinic VO2 and NiO is determined to be (011)(VO2)||{100}(NiO) and [01 (1) over bar](VO2)||[001](NiO) at room temperature. The epitaxial alignment at the temperature of growth where tetragonal VO2 is stable is determined as: (110)(VO2)||{100}(NiO) and [001](VO2)||[100](NiO). A cube-on-cube crystallographic alignment is established across the NiO{100}/MgO{100}/TiN{100}/Si{100} interfaces. The misfit strains across the VO2/NiO interface at the growth temperature are calculated and the mechanism of strain relaxation is discussed. The out-of-plane orientation is found to be relaxed in both monoclinic and tetragonal states of VO2. It is shown that a compressive strain of 31.65% along the [001] direction of tetragonal VO2 is fully relaxed via matching of multiple domains. However, a small tensile misfit strain of about 5% along [1 (1) over bar >0] direction cannot relax and remains in the lattice. This tensile residual strain leads to a compressive strain along [001] axis which, in turn, results in an SMT temperature slightly lower than that of freestanding strain-free VO2. SMT characteristics of VO2(011) epilayers are assessed where an amplitude of near five orders of magnitude, and a hysteresis of less than 3.6 C-degrees are obtained. This study introduces VO2/NiO thin film heterostructure integrated with silicon as a promising candidate for multifunctional devices with novel characteristics where a combination of sensing, manipulation, and response functions is needed.
引用
收藏
页码:1201 / 1208
页数:8
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