机构:
Korea Univ, Dept Chem & Biol Engn, Seoul 136701, South KoreaUniv Florida, Dept Chem Engn, Gainesville, FL 32611 USA
Kim, H. -Y.
[2
]
Kim, J.
论文数: 0引用数: 0
h-index: 0
机构:
Korea Univ, Dept Chem & Biol Engn, Seoul 136701, South KoreaUniv Florida, Dept Chem Engn, Gainesville, FL 32611 USA
Kim, J.
[2
]
Pearton, S. J.
论文数: 0引用数: 0
h-index: 0
机构:
Univ Florida, Dept Mat Sci & Engn, Gainesville, FL 32611 USAUniv Florida, Dept Chem Engn, Gainesville, FL 32611 USA
Pearton, S. J.
[3
]
Laboutin, O.
论文数: 0引用数: 0
h-index: 0
机构:
Kopin Corp, Taunton, MA 02780 USAUniv Florida, Dept Chem Engn, Gainesville, FL 32611 USA
Laboutin, O.
[4
]
Cao, Yu
论文数: 0引用数: 0
h-index: 0
机构:
Kopin Corp, Taunton, MA 02780 USAUniv Florida, Dept Chem Engn, Gainesville, FL 32611 USA
Cao, Yu
[4
]
Johnson, J. W.
论文数: 0引用数: 0
h-index: 0
机构:
Kopin Corp, Taunton, MA 02780 USAUniv Florida, Dept Chem Engn, Gainesville, FL 32611 USA
Johnson, J. W.
[4
]
Kravchenko, I. I.
论文数: 0引用数: 0
h-index: 0
机构:
Oak Ridge Natl Lab, Ctr Nanophase Mat Sci, Oak Ridge, TN 37830 USAUniv Florida, Dept Chem Engn, Gainesville, FL 32611 USA
Kravchenko, I. I.
[5
]
机构:
[1] Univ Florida, Dept Chem Engn, Gainesville, FL 32611 USA
[2] Korea Univ, Dept Chem & Biol Engn, Seoul 136701, South Korea
[3] Univ Florida, Dept Mat Sci & Engn, Gainesville, FL 32611 USA
[4] Kopin Corp, Taunton, MA 02780 USA
[5] Oak Ridge Natl Lab, Ctr Nanophase Mat Sci, Oak Ridge, TN 37830 USA
来源:
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
|
2011年
/
29卷
/
06期
关键词:
aluminium compounds;
contact resistance;
gallium compounds;
high electron mobility transistors;
III-V semiconductors;
indium compounds;
proton effects;
wide band gap semiconductors;
PERFORMANCE;
GAN;
D O I:
10.1116/1.3644480
中图分类号:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号:
0808 ;
0809 ;
摘要:
The effects of proton irradiation on the dc characteristics of InAlN/GaN high electron mobility transistors were investigated. In this study we used 5 MeV protons with doses varying from 2 x 10(11) to 2 x 10(15) cm(-2). The transfer resistance and contact resistivity suffered more degradation as compared to the sheet resistance. With irradiation at the highest dose of 2 x 10(15) cm(-2), both forward- and reverse-bias gate currents were increased after proton irradiation. A negative threshold-shift and reduction of the saturation drain current were also observed as a result of radiation-induced carrier scattering and carrier removal. Devices irradiated with doses of 2 x 10(11) to 2 x 10(15) cm(-2) exhibited minimal degradation of the saturation drain current and extrinsic transconductance. These results show that InAlN/GaN high electron mobility transistors are attractive for space-based applications when high-energy proton fluxes are present. (C) 2011 American Vacuum Society. [DOI: 10.1116/1.3644480]