Artificially induced ferroelectric-like behavior in an antiferroelectric sandwich structure by interface engineering

被引:0
作者
Er, Xiaokuo [1 ]
Chen, Peng [1 ]
Yu, Xiaobo [1 ]
Wang, Qiangqiang [2 ]
Bian, Zhenxu [1 ]
Zhan, Qian [1 ]
机构
[1] Univ Sci & Technol Beijing, Sch Mat Sci & Engn, Beijing 100083, Peoples R China
[2] China Univ Geosci Beijing, Sch Math & Phys, Beijing 100083, Peoples R China
基金
中国国家自然科学基金;
关键词
Ferroelectric polarization enhancement; Heterointerface; HfO 2 dielectric layer; Antiferroelectric sandwich structures; Pb0; 94La0; 06(Zr0; 95Ti0; 05)O3; POLARIZATION; ENHANCEMENT;
D O I
10.1016/j.jeurceramsoc.2022.09.011
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Interface engineering is essential for achieving fascinating interfacial functionalities in a single all-oxide -interface-based device. In the present work, a sandwich structure (Pb0.94La0.06(Zr0.95Ti0.05)O3 (PLZT)/HfO2/ Pb0.94La0.06(Zr0.95Ti0.05)O3) was fabricated via a chemical solution approach. A distinct "ferroelectricity-like" behavior with high Pmax (-80 mu C/cm2) and Pr (-36 mu C/cm2) is demonstrated. The dielectric HfO2 thin layer presents a tetragonal symmetry structure, which stabilizes a slight distorted structure of the upper PLZT layer (PLZT(T)) with a= 4.19(9) angstrom, b= 4.10(6) angstrom, beta -91.04. In PLZT(T), the ferroelectric (FE) phase is identified as the matrix embedded with a small amount of AFE nanodomains, while the bottom PLZT layer (PLZT(B)) exhibits typical AFE incommensurately modulated structures. The near-interface structures in both PLZT layers are characterized by ferroelectric polarizations with head-to-tail configuration across the heterointerface. Such discontinuous, downward polarizations support the accumulation of oxygen vacancies at the heterointerface that facilitate the local polarization enhancement. It is the combination effect of stable ferroelectric polarization in the PLZT(T) layer, interfacial oxygen vacancies and large surface to volume ratio that leads to the superior polarization performance of the antiferroelectric sandwich structure. It indicates that interface engineering is a feasible approach to manipulate the ferroic behavior.
引用
收藏
页码:7441 / 7447
页数:7
相关论文
共 32 条
[1]   Interface Engineering of Domain Structures in BiFeO3 Thin Films [J].
Chen, Deyang ;
Chen, Zuhuang ;
He, Qian ;
Clarkson, James D. ;
Serrao, Claudy R. ;
Yadav, Ajay K. ;
Nowakowski, Mark E. ;
Fan, Zhen ;
You, Long ;
Gao, Xingsen ;
Zeng, Dechang ;
Chen, Lang ;
Borisevich, Albina Y. ;
Salahucldin, Sayeef ;
Liu, Jun-Ming ;
Bokor, Jeffrey .
NANO LETTERS, 2017, 17 (01) :486-493
[2]   Enhanced energy-storage performance in a flexible film capacitor with coexistence of ferroelectric and polymorphic antiferroelectric domains [J].
Er, Xiaokuo ;
Chen, Peng ;
Guo, Jiesen ;
Hou, Yuxuan ;
Yu, Xiaobo ;
Liu, Pingping ;
Bai, Yang ;
Zhan, Qian .
JOURNAL OF MATERIOMICS, 2022, 8 (02) :375-381
[3]   Realization of high energy density in an ultra-wide temperature range through engineering of ferroelectric sandwich structures [J].
Fan, Qiaolan ;
Ma, Chunrui ;
Li, Yi ;
Liang, Zhongshuai ;
Cheng, Sheng ;
Guo, Mengyao ;
Dai, Yanzhu ;
Ma, Chuansheng ;
Lu, Lu ;
Wang, Wei ;
Wang, Linghang ;
Lou, Xiaojie ;
Liu, Ming ;
Wang, Hong ;
Jia, Chun-Lin .
NANO ENERGY, 2019, 62 :725-733
[4]   Unveiling the ferrielectric nature of PbZrO3-based antiferroelectric materials [J].
Fu, Zhengqian ;
Chen, Xuefeng ;
Li, Zhenqin ;
Hu, Tengfei ;
Zhang, Linlin ;
Lu, Ping ;
Zhang, Shujun ;
Wang, Genshui ;
Dong, Xianlin ;
Xu, Fangfang .
NATURE COMMUNICATIONS, 2020, 11 (01)
[5]   Depth dependent ferroelectric to incommensurate/commensurate antiferroelectric phase transition in epitaxial lanthanum modified lead zirconate titanate thin films [J].
Gao, Min ;
Tang, Xiao ;
Dai, Steve ;
Li, Jiefang ;
Viehland, D. .
APPLIED PHYSICS LETTERS, 2019, 115 (07)
[6]   Enhancement of energy storage in epitaxial PbZrO3 antiferroelectric films using strain engineering [J].
Ge, Jun ;
Remiens, Denis ;
Dong, Xianlin ;
Chen, Ying ;
Costecalde, Jean ;
Gao, Feng ;
Cao, Fei ;
Wang, Genshui .
APPLIED PHYSICS LETTERS, 2014, 105 (11)
[7]   Stabilizing the ferroelectric phase in doped hafnium oxide [J].
Hoffmann, M. ;
Schroeder, U. ;
Schenk, T. ;
Shimizu, T. ;
Funakubo, H. ;
Sakata, O. ;
Pohl, D. ;
Drescher, M. ;
Adelmann, C. ;
Materlik, R. ;
Kersch, A. ;
Mikolajick, T. .
JOURNAL OF APPLIED PHYSICS, 2015, 118 (07)
[8]   Enhanced Energy Storage Performance of Lead-Free Capacitors in an Ultrawide Temperature Range via Engineering Paraferroelectric and Relaxor Ferroelectric Multilayer Films [J].
Hu, Tian-Yi ;
Ma, Chunrui ;
Dai, Yanzhu ;
Fan, Qiaolan ;
Liu, Ming ;
Jia, Chun-Lin .
ACS APPLIED MATERIALS & INTERFACES, 2020, 12 (23) :25930-25937
[9]   Interface Engineering and Emergent Phenomena in Oxide Heterostructures [J].
Huang, Zhen ;
Ariando ;
Wang, Xiao Renshaw ;
Rusydi, Andrivo ;
Chen, Jingsheng ;
Yang, Hyunsoo ;
Venkatesan, Thirumalai .
ADVANCED MATERIALS, 2018, 30 (47)
[10]   Ferroelectrically Gated Atomically Thin Transition-Metal Dichalcogenides as Nonvolatile Memory [J].
Ko, Changhyun ;
Lee, Yeonbae ;
Chen, Yabin ;
Suh, Joonki ;
Fu, Deyi ;
Suslu, Aslihan ;
Lee, Sangwook ;
Clarkson, James David ;
Choe, Hwan Sung ;
Tongay, Sefaatin ;
Ramesh, Ramamoorthy ;
Wu, Junqiao .
ADVANCED MATERIALS, 2016, 28 (15) :2923-2930