Temperature-gradient and composition-spread deposition of epitaxial oxide films and high throughput characterization

被引:1
作者
Fukumura, T [1 ]
Ohtani, M [1 ]
Nishimura, J [1 ]
Kageyama, T [1 ]
Koida, T [1 ]
Lippmaa, M [1 ]
Kawasaki, M [1 ]
Hasegawa, T [1 ]
Koinuma, H [1 ]
机构
[1] Tokyo Inst Technol, Midori Ku, Yokohama, Kanagawa 2268502, Japan
来源
COMBINATORIAL AND COMPOSITION SPREAD TECHNIQUES IN MATERIALS AND DEVICE DEVELOPMENT II | 2001年 / 4281卷
关键词
combinatorial materials science; composition-spread; temperature-gradient; combinatorial laser MBE; concurrent XRD; oxide film; epitaxial thin film; scanning SQUID microscope;
D O I
10.1117/12.424755
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We have developed a laser molecular beam epitaxy system capable of the temperature-gradient and/or composition-spread integration of thin films in a substrate. The latter is achieved by using a moving mask system synchronizing with target exchange and laser pulse. The former employs a substrate holder having a controlled asymmetric thermal conduction heated by a focused Nd:YAG continuous wave laser beam. A concurrent x-ray diffractometer can immediately characterize the dependences of the lattice constant and crystalline quality on the film growth temperature and composition. The temperature-gradient method is very useful for revealing an optimum substrate temperature for epitaxial thin film growth. Several other characterization techniques such as magnetic field microscope and parallel transport measurement system developed for characterizing composition-spread thin films are presented.
引用
收藏
页码:17 / 26
页数:10
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