Silicon-hydrogen bond activation and formation of silane complexes using a cationic Rhodium(III) complex

被引：51

作者：

Taw, FL

Bergman, RG

Brookhart, M ^{[1
]}

机构：

[1] Univ Calif Berkeley, Dept Chem, Berkeley, CA 94720 USA

[2] Lawrence Berkeley Natl Lab, Dept Chem Sci, Berkeley, CA 94720 USA

[3] Univ N Carolina, Dept Chem, Chapel Hill, NC 27599 USA

来源：

ORGANOMETALLICS | 2004年 / 23卷 / 04期

关键词：

D O I：

10.1021/om0341303

中图分类号：

O61 [无机化学];

学科分类号：

070301 ; 081704 ;

摘要：

Addition of triphenylsilane, trimethylsilane, or triethylsilane to [Cp*(PMe3)Rh(Me)(CH2Cl2)]BAr'(4) (4), a cationic Rh(III) complex, resulted in Si-H bond activation and release of methane below -80 degreesC. The rare, nonclassical silane complexes [Cp*(PMe3)Rh((C6H4)(eta(2)HSiPh(2)))]BAr'(4) (6), [Cp*(PMe3)Rh(SiMe3)(eta(2)-HSiMe3)]BAr'(4) (9), and [Cp*(PMe3)Rh(SiEt3)(eta(2)-HSiEt3)] BAr'(4) (11) have been generated and characterized by NMR spectroscopy. Of note was the presence of Si-29 satellites of the hydride resonances of each of these compounds and large (1)J(Si-H) coupling constants (56-84 Hz), diagnostic of the presence of eta(2)-silane ligands.

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页码：886 / 890

页数：5

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