Testing a furfuryl alcohol resin as a negative photoresist

被引：10

作者：

Sthel, M ^{[1
]}

Rieumont, J ^{[1
]}

Martinez, R ^{[1
]}

机构：

[1] State Univ N Fluminense, Ctr Sci & Technol, Campos, RJ, Brazil

来源：

POLYMER TESTING | 1999年 / 18卷 / 01期

关键词：

D O I：

10.1016/S0142-9418(98)00006-3

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Poly(furfuryl alcohol) was prepared using methylene dichloride as solvent and trifluoroacetic acid as catalyst. Synthesis was monitored in order to achieve a desirable structure capable of crosslinking under the action of light. The resulting product was a soluble dark brown resin that gave remarkable photocrosslinking performance as a negative photoresist when exposed to ultraviolet light, giving photolithographic patterns with a resolution of about 5 mu m. (C) 1999 Elsevier Science Ltd. All rights reserved.

引用

页码：47 / 50

页数：4