First environmental data from the EUV engineering test stand

被引：32

作者：

Klebanoff, LE ^{[1
]}

Malinowski, ME ^{[1
]}

Grunow, P ^{[1
]}

Clift, WM ^{[1
]}

Steinhaus, C ^{[1
]}

Leung, AH ^{[1
]}

Haney, SJ ^{[1
]}

机构：

[1] Sandia Natl Labs, Livermore, CA 94550 USA

来源：

EMERGING LITHOGRAPHIC TECHNOLOGIES V | 2001年 / 4343卷

关键词：

contamination; oxidation; EUV; lithography;

D O I：

10.1117/12.436676

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The first environmental data from the Engineering Test Stand (ETS) has been collected. Excellent control of high-mass hydrocarbons has been observed. This control is a result of extensive outgas testing of components and materials, vacuum compatible design of the ETS, careful cleaning of parts and pre-baking of cables and sub assemblies where possible, and clean assembly procedures. As a result of the hydrocarbon control, the residual ETS vacuum environment is rich in water vapor. Analysis of witness plate data indicates that the ETS environment does not pose a contamination risk to the optics in the absence of EUV irradiation. However, with EUV exposure, the water rich environment can lead to EUV-induced water oxidation of the Si-terminated Mo/Si optics. Added ethanol can prevent optic oxidation, allowing carbon growth via EUV "cracking" of low-level residual hydrocarbons to occur. The EUV environmental issues are understood, mitigation approaches have been validated, and EUV optic contamination appears to be manageable.

引用

页码：342 / 346

页数：5

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