The photochemical behaviour of poly(vinyl alcohol)/clay nanocomposite films with a natural Montmorillonite clay (MMt-Na+) and a synthetic Laponite clay at varying concentrations (up to 10 wt%) was investigated. Nanocomposite films were exposed to UV-visible light irradiation (lambda > 300 nm) in accelerated ageing conditions in both the presence and absence of oxygen. Under photo-oxidation conditions, the same photoproducts of PVA were formed in the presence of both clays, but a discrepancy in the photo-oxidation rate of PVA was observed for the different clays. MMt-Na+ displays a pro-degradant effect that was influenced by the clay content, whereas Laponite has no influence on the oxidation rate of PVA. However, in the absence of oxygen, both PVA/clay nanocomposites proved to be as photostable as PVA. (C) 2012 Elsevier Ltd. All rights reserved.
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Toyota Technol Inst, Grad Sch Engn, Tempa Ku, Nagoya, Aichi 4688511, JapanToyota Technol Inst, Grad Sch Engn, Tempa Ku, Nagoya, Aichi 4688511, Japan
Ray, SS
Okamoto, M
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Toyota Technol Inst, Grad Sch Engn, Tempa Ku, Nagoya, Aichi 4688511, JapanToyota Technol Inst, Grad Sch Engn, Tempa Ku, Nagoya, Aichi 4688511, Japan
机构:
Univ Blaise Pascal, CNRS, UMR 6505, Photochim Mol & Macromol Lab, F-63177 Aubiere, FranceUniv Blaise Pascal, CNRS, UMR 6505, Photochim Mol & Macromol Lab, F-63177 Aubiere, France
Rivaton, Agnes
Chambon, Sylvain
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Univ Blaise Pascal, CNRS, UMR 6505, Photochim Mol & Macromol Lab, F-63177 Aubiere, FranceUniv Blaise Pascal, CNRS, UMR 6505, Photochim Mol & Macromol Lab, F-63177 Aubiere, France
Chambon, Sylvain
Manceau, Matthieu
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Univ Blaise Pascal, CNRS, UMR 6505, Photochim Mol & Macromol Lab, F-63177 Aubiere, France
CEA Grenoble, DRT LITEN DTS LCS, INES RDI, F-73377 Le Bourget Du Lac, FranceUniv Blaise Pascal, CNRS, UMR 6505, Photochim Mol & Macromol Lab, F-63177 Aubiere, France
Manceau, Matthieu
Gardette, Jean-Luc
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Univ Blaise Pascal, CNRS, UMR 6505, Photochim Mol & Macromol Lab, F-63177 Aubiere, FranceUniv Blaise Pascal, CNRS, UMR 6505, Photochim Mol & Macromol Lab, F-63177 Aubiere, France
Gardette, Jean-Luc
Lamaitre, Noella
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CEA Grenoble, DRT LITEN DTS LCS, INES RDI, F-73377 Le Bourget Du Lac, FranceUniv Blaise Pascal, CNRS, UMR 6505, Photochim Mol & Macromol Lab, F-63177 Aubiere, France
Lamaitre, Noella
Guillerez, Stephane
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CEA Grenoble, DRT LITEN DTS LCS, INES RDI, F-73377 Le Bourget Du Lac, FranceUniv Blaise Pascal, CNRS, UMR 6505, Photochim Mol & Macromol Lab, F-63177 Aubiere, France
机构:
Toyota Technol Inst, Grad Sch Engn, Tempa Ku, Nagoya, Aichi 4688511, JapanToyota Technol Inst, Grad Sch Engn, Tempa Ku, Nagoya, Aichi 4688511, Japan
Ray, SS
Okamoto, M
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Toyota Technol Inst, Grad Sch Engn, Tempa Ku, Nagoya, Aichi 4688511, JapanToyota Technol Inst, Grad Sch Engn, Tempa Ku, Nagoya, Aichi 4688511, Japan
机构:
Univ Blaise Pascal, CNRS, UMR 6505, Photochim Mol & Macromol Lab, F-63177 Aubiere, FranceUniv Blaise Pascal, CNRS, UMR 6505, Photochim Mol & Macromol Lab, F-63177 Aubiere, France
Rivaton, Agnes
Chambon, Sylvain
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h-index: 0
机构:
Univ Blaise Pascal, CNRS, UMR 6505, Photochim Mol & Macromol Lab, F-63177 Aubiere, FranceUniv Blaise Pascal, CNRS, UMR 6505, Photochim Mol & Macromol Lab, F-63177 Aubiere, France
Chambon, Sylvain
Manceau, Matthieu
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Univ Blaise Pascal, CNRS, UMR 6505, Photochim Mol & Macromol Lab, F-63177 Aubiere, France
CEA Grenoble, DRT LITEN DTS LCS, INES RDI, F-73377 Le Bourget Du Lac, FranceUniv Blaise Pascal, CNRS, UMR 6505, Photochim Mol & Macromol Lab, F-63177 Aubiere, France
Manceau, Matthieu
Gardette, Jean-Luc
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机构:
Univ Blaise Pascal, CNRS, UMR 6505, Photochim Mol & Macromol Lab, F-63177 Aubiere, FranceUniv Blaise Pascal, CNRS, UMR 6505, Photochim Mol & Macromol Lab, F-63177 Aubiere, France
Gardette, Jean-Luc
Lamaitre, Noella
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机构:
CEA Grenoble, DRT LITEN DTS LCS, INES RDI, F-73377 Le Bourget Du Lac, FranceUniv Blaise Pascal, CNRS, UMR 6505, Photochim Mol & Macromol Lab, F-63177 Aubiere, France
Lamaitre, Noella
Guillerez, Stephane
论文数: 0引用数: 0
h-index: 0
机构:
CEA Grenoble, DRT LITEN DTS LCS, INES RDI, F-73377 Le Bourget Du Lac, FranceUniv Blaise Pascal, CNRS, UMR 6505, Photochim Mol & Macromol Lab, F-63177 Aubiere, France