A formation mechanism for ultra-thin nanotwins in highly textured Cu/Ni multilayers

被引：37

作者：

Liu, Y. ^{[1
]}

Bufford, D. ^{[1
]}

Rios, S. ^{[1
]}

Wang, H. ^{[2
]}

Chen, J. ^{[3
]}

Zhang, J. Y. ^{[1
,4
]}

Zhang, X. ^{[1
]}

机构：

[1] Texas A&M Univ, Dept Mech Engn, Mat Sci & Engn Program, College Stn, TX 77843 USA

[2] Texas A&M Univ, Dept Elect Engn, Mat Sci & Engn Program, College Stn, TX 77843 USA

[3] Liaoning Shihua Univ, Dept Mech Engn, Fushun 113001, Peoples R China

[4] Xi An Jiao Tong Univ, State Key Lab Mech Behav Mat, Xian 710049, Peoples R China

来源：

JOURNAL OF APPLIED PHYSICS | 2012年 / 111卷 / 07期

基金：

美国国家科学基金会;

关键词：

STACKING-FAULT-ENERGY; HIGH-STRENGTH; CU; DISLOCATIONS; FILMS; RELAXATION; THICKNESS; STRAIN; ALLOYS;

D O I：

10.1063/1.3702461

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

High density nanotwins with average twin thickness varying from 3 to 6 nm are formed in sputtered highly (111) textured Cu/Ni multilayers, when individual layer thickness is 25 nm or less. Twin interfaces are normal to growth direction. Both maximum twin thickness and volume fraction of twins vary with the individual layer thickness. Coherency stress plays an important role in tailoring the formation of nanotwins. Nanotwins compete with misfit dislocations in accommodating elastic strain energy in epitaxial Cu/Ni multilayers. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.3702461]

引用

页数：7

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