Isolation a new strain of Kocuria rosea capable of tolerating extreme conditions

被引:29
作者
Gholami, M. [1 ]
Etemadifar, Z. [1 ]
Bouzari, M. [1 ]
机构
[1] Univ Isfahan, Fac Sci, Dept Biol, Esfahan 8174673441, Iran
关键词
UV-radiation resistant bacteria; Kocuria rosea; Flow cytometry; Multiple-stress conditions; DEINOCOCCUS-RADIODURANS R1; IONIZING-RADIATION; BACTERIAL VIABILITY; INACTIVATION; DESICCATION; RESISTANCE; TOLERANCE; SPP; NOV; PCR;
D O I
10.1016/j.jenvrad.2015.03.010
中图分类号
X [环境科学、安全科学];
学科分类号
08 ; 0830 ;
摘要
A new actinobacterial strain was isolated from Ab-e-Siah spring (dark water) taken from the Ramsar city in Iran, and subjected to several stress conditions investigation. The isolate, named MG2 strain, was Gram-positive, aerobic, diplococci or tetrad shaped, non-spore forming and non-motile. Phylogenetic analysis of the isolate using 16S rDNA sequence indicated that the organism matched best with the genus Kocuria and the highest sequence similarities (98.55%) being found with Kocuria rosea. The 16S rDNA sequence determined in this study has been deposited in the NCBI database with the accession no. JX534199, K. rosea strain MG2. The isolated strain was an alkaliphilic-mesophilic bacterium because the optimal growth was observed at pH 9.2 and temperature of 28 degrees C under aerobic condition. MG2 was a halotolerant strain and tolerated maximally to 15% NaCl concentraion. Viability analysis by flow cytometry indicated that this strain had highly resistance to UV-C radiation and moderately resistance to desiccation after 28 days. The viability of K. rosea strains MG2 and Deinococcus radiodurans R1 were determined D-87 and D-98 according to D index, respectively, by a dose radiation 25 J/cm (Appukuttan et al., 2006). Thus the UV resistance of strain MG2 was comparable with representative radiation resistant Deinococcus. Also MG2 was grown at 1-4% of H2O2 as an oxidant agent. This research is the first study on multiple extreme resistance of Kocuria rosea new strain (MG2) isolated in Iran. (C) 2015 Elsevier Ltd. All rights reserved.
引用
收藏
页码:113 / 119
页数:7
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