Modeling plasma-assisted growth of graphene-carbon nanotube hybrid

被引:9
|
作者
Tewari, Aarti [1 ]
机构
[1] Delhi Technol Univ, Dept Appl Phys, Bawana Rd, Delhi 110042, India
关键词
CHEMICAL-VAPOR-DEPOSITION; FIELD-EMISSION CHARACTERISTICS; CATALYTIC GROWTH; ARC-DISCHARGE; LAYER; MECHANISM; KINETICS;
D O I
10.1063/1.4960328
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
A theoretical model describing the growth of graphene-CNT hybrid in a plasma medium is presented. Using the model, the growth of carbon nanotube (CNT) on a catalyst particle and thereafter the growth of the graphene on the CNT is studied under the purview of plasma sheath and number density kinetics of different plasma species. It is found that the plasma parameter such as ion density; gas ratios and process parameter such as source power affect the CNT and graphene dimensions. The variation in growth rates of graphene and CNT under different plasma power, gas ratios, and ion densities is analyzed. Based on the results obtained, it can be concluded that higher hydrocarbon ion densities and gas ratios of hydrocarbon to hydrogen favor the growth of taller CNTs and graphene, respectively. In addition, the CNT tip radius reduces with hydrogen ion density and higher plasma power favors graphene with lesser thickness. The present study can help in better understanding of the graphene-CNT hybrid growth in a plasma medium. Published by AIP Publishing.
引用
收藏
页数:9
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