Comparison between the ultraviolet emission from pulsed microhollow cathode discharges in xenon and argon

被引：14

作者：

Petzenhauser, I ^{[1
]}

Biborosch, LD

Ernst, U

Frank, K

Schoenbach, KH

机构：

[1] Univ Erlangen Nurnberg, Dept Phys 1, FA, D-91058 Erlangen, Germany

[2] Al I Cuza Univ Iasi, Dept Plasma Phys, R-700365 Iasi, Romania

[3] Old Dominion Univ, Phys Elect Res Inst, Norfolk, VA 23529 USA

来源：

APPLIED PHYSICS LETTERS | 2003年 / 83卷 / 21期

关键词：

D O I：

10.1063/1.1626020

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We measured the dynamic I-V characteristics and vacuum ultraviolet (VUV) emission lines of the second continuum in xenon (170 nm) and argon (130.5 nm) from pulsed microhollow cathode discharges (MHCD). For pulse lengths between 1 and 100 mus the dynamic I-V characteristics are similar in both inert gases. Only the time variation of the VUV emission line at 170 nm for xenon can be related to the dimer excited states. In argon the energy transfer between the Ar-2(*) dimers and the oxygen impurity atoms is responsible for a qualitatively different time behavior of the resonance line at 130.5 nm. Consequently, the relative VUV efficiency reveals an inverse dependence on the electrical pulse lengths for the MHCD in xenon and argon, respectively. (C) 2003 American Institute of Physics.

引用

页码：4297 / 4299

页数：3

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