A MEMS fabrication approach for a 200GHz microklystron driven by a small-scaled pseudospark electron beam

被引:5
作者
Schuhmann, Tom [1 ]
Protz, Jonathan [1 ]
Fields, David [2 ]
Yin, Helen
Cross, Adrian [3 ]
He, Wenlong [3 ]
Bowes, David [3 ]
Ronald, Kevin [3 ]
Phelps, Alan [3 ]
机构
[1] Duke Univ, Pratt Sch Engn, Durham, NC 27708 USA
[2] Logos Technol, Arlington, VA 22203 USA
[3] Univ Strathclyde, SUPA, Dept Phys, Glasgow G4 0NG, Lanark, Scotland
来源
MILLIMETRE WAVE AND TERAHERTZ SENSORS AND TECHNOLOGY III | 2010年 / 7837卷
基金
英国工程与自然科学研究理事会;
关键词
MEMS; THz; klystron; pseudospark;
D O I
10.1117/12.864902
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
High performance terahertz (THz) radiation sources hold great promise for a variety of military and space applications. With micro-electro-mechanical systems (MEMS) fabrication techniques, it is possible to attain the smaller, more precisely machined resonant structures required by Vacuum Electronic Devices (VEDs) to function in these frequencies. The research presented here proposes a design and fabrication process for a micro-klystron with a targeted operating frequency of 200 GHz; being developed jointly by Duke University, the University of Strathclyde, UK, and Logos Technologies. It also analyzes the use of a pseudospark (PS) discharge as a novel electron beam source to drive the klystron. Dimensional tolerances are investigated using both analytic and numeric techniques. The incorporation of alignment structures into the fabrication process that utilize kinematic and elastic averaging effects, along with clever stacking techniques, allows submicron alignment tolerances yielding an expected power output of approximately 5W per klystron with an overall efficiency of 20%. The device proposed here, with a volume on the order of 0.01 cc, should be capable of output power densities of up to 1kW/cc. A fabrication run recently completed at MIT's Microsystems Technology Laboratories yielded promising results and 32 silicon die were successfully bonded into a stack 1.4cm tall. Difficulties remain, however, in controlling surface roughness and integrating a klystron with alignment features for parallel processing. Several alternative fabrication schemes have been proposed and another fabrication run based on these modifications is currently underway.
引用
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页数:6
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