The optical properties of monolayer amorphous Al2O3-TiO2 composite films used as HT-APSM blanks for ArF immersion lithography

被引：3

作者：

Lai, Fu-Der ^{[1
]}

Huang, C. Y.

Ko, Fu-Hsiang

机构：

[1] Natl Kaohsiung First Univ Sci & Technol, Inst Elect Opt Engn, Kaohsiung 811, Taiwan

[2] Tatung Univ, Dept Mat Engn, Taipei 104, Taiwan

[3] Natl Chiao Tung Univ, Inst Nanotechnol, Hsinchu 300, Taiwan

来源：

MICROELECTRONIC ENGINEERING | 2007年 / 84卷 / 5-8期

关键词：

composite film; high transmittance attenuated phase shift mask; ArF immersion lithography; optical property;

D O I：

10.1016/j.mee.2007.01.214

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Amorphous (Al2O3)(x)-(TiO2)(1-x) composite films are prepared using r.f. unbalanced magnetron sputtering in an atmosphere of argon and oxygen at room temperature. The optical constants of (Al2O3)(x)-(TiO2)(1-x) composite films are linearly dependent on the Al2O3 mole fraction in the Al2O3-TiO2 composite film. The optical constants of these Al2O3-TiO2 Composite films can be made to meet the optical requirements for a high transmittance attenuated phase shift mask (HT-APSM) blank by tuning the Al2O3 mole fraction. The Al2O3 mole fraction range that would allow the films to meet the optical requirements of an HT-APSM blank for ArF immersion lithography is calculated to be between 76% and 84%. One Tu-phase-shifted Al2O3-TiO2 composite thin film to be used as an HT-APSM blank for ArF immersion lithography is fabricated and is shown to satisfy the optical requirements. (c) 2007 Elsevier B.V. All rights reserved.

引用

页码：716 / 720

页数：5

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