Micronucleus formation induced by dielectric barrier discharge plasma exposure in brain cancer cells

被引：75

作者：

Kaushik, Nagendra K. ^{[1
]}

Uhm, Hansup ^{[1
]}

Choi, Eun Ha ^{[1
]}

机构：

[1] Kwangwoon Univ, Plasma Biosci Res Ctr, Seoul 139701, South Korea

来源：

APPLIED PHYSICS LETTERS | 2012年 / 100卷 / 08期

基金：

新加坡国家研究基金会;

关键词：

BACILLUS-SUBTILIS SPORES; NEEDLE; INACTIVATION; TEMPERATURE; BACTERIA;

D O I：

10.1063/1.3687172

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Induction of micronucleus formation (cytogenetic damage) in brain cancer cells upon exposure of dielectric barrier discharge plasma has been investigated. We have investigated the influence of exposure and incubation times on T98G brain cancer cells by using growth kinetic, clonogenic, and micronucleus formation assay. We found that micronucleus formation rate directly depends on the plasma exposure time. It is also shown that colony formation capacity of cells has been inhibited by the treatment of plasma at all doses. Cell death and micronucleus formation are shown to be significantly elevated by 120 and 240 s exposure of dielectric barrier discharge plasma. (C) 2012 American Institute of Physics. [doi:10.1063/1.3687172]

引用

页数：4

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