Optical and structural analysis of ammonia-free cooper sulphide thin films using chemical deposition method

被引：0

作者：

Castillo, S. J. ^{[2
]}

Apolinar-Iribe, A. ^{[1
]}

De Leon, Aned ^{[3
]}

Ruvalcaba-Cornejo, C. ^{[4
]}

机构：

[1] Univ Sonora, Dept Fis, Hermosillo 83000, Sonora, Mexico

[2] Univ Sonora, Dept Invest Fis, Hermosillo 83000, Sonora, Mexico

[3] Univ Sonora, Dept Invest Polimeros & Mat, Hermosillo 83000, Sonora, Mexico

[4] Univ Sonora, Dept Matemat, Hermosillo 83000, Sonora, Mexico

来源：

JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS | 2011年 / 13卷 / 9-10期

关键词：

CuS; Thin film; Chemical deposition; SPRAY-PYROLYSIS DEPOSITION; LAYER ADSORPTION; BATH DEPOSITION; COPPER SULFIDES; CUS; ELECTRODEPOSITION; GROWTH;

D O I：

暂无

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We report the synthesis of cooper sulphide thin films ammonia-free by chemical bath method using triethanolamine and barium hydroxide as chelating agents and were deposited on glass microscope slides at 60 degrees C. The use of these complexing agents improving the adhesion of the deposited films and reduces of time reaction. The structural characterization was carried out by X-ray diffraction and atomic force microscopic. The X-ray diffraction analysis showed a amorphous nature of thin film and indirect transition with a bandgap of 1.28 eV and index refraction of the 1.515.

引用

页码：1258 / 1261

页数：4

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