Simulation of shape evolution during electrodeposition of copper in the presence of additives

被引:0
|
作者
Veyret, D [1 ]
Georgiadou, M [1 ]
Sani, RL [1 ]
Verhoff, M [1 ]
Alkire, RC [1 ]
机构
[1] Univ Illinois, Dept Chem Engn, Urbana, IL 61801 USA
来源
FUNDAMENTAL ASPECTS OF ELECTROCHEMICAL DEPOSITION AND DISSOLUTION, PROCEEDINGS | 2000年 / 99卷 / 33期
关键词
D O I
暂无
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Shape evolution during electrodeposition of copper in microtrenches was studied numerically by a model which incorporates adaptive meshing capabilities. Filling of trenches with copper without creating a void or a seam was related to plating additives in solution. The shape-change behavior of this system resulting from variation of the feature's aspect ratio, bulk composition and level of additive components was investigated. It was illustrated that the attribute of superconformal deposition, herein called superfilling, is facilitated at shallower features for the conditions studied in the present work. The operating window of bath conditions for engineering electrodeposition to produce superfilling performance was studied in the range of 10(-4) to 10(-1) M bulk concentration of additive in a 1.5 M CuSO4 + 0.05 M H2SO4 plating solution and for aspect ratios (depth:width) from 0.5 to 4. The mathematical model includes fluid flow, transport by diffusion, migration and convection, multiple species and reactions in complex geometries. It is incorporated in a collaborative Web-based modeling environment providing a friendly interface for linking models at a variety of scales.
引用
收藏
页码:405 / 412
页数:8
相关论文
共 50 条
  • [1] Simulation of shape evolution during electrodeposition of copper in the presence of additive
    Georgiadou, M
    Veyret, D
    Sani, RL
    Alkire, RC
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2001, 148 (01) : C54 - C58
  • [2] Evolution of surface roughness during copper electrodeposition in the presence of additives - Comparison of experiments and Monte Carlo simulations
    Drews, TO
    Ganley, JC
    Alkire, RC
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2003, 150 (05) : C325 - C334
  • [3] Simulation of TSV copper electrodeposition process with additives
    Luo, Wei
    Cao, Haiyong
    Gao, Liming
    Li, Ming
    2013 14TH INTERNATIONAL CONFERENCE ON ELECTRONIC PACKAGING TECHNOLOGY (ICEPT), 2013, : 480 - 484
  • [4] Validity of the linear growth equation for interface evolution for copper electrodeposition in the presence of organic additives
    Vazquez, L
    Salvarezza, RC
    Arvia, AJ
    PHYSICAL REVIEW LETTERS, 1997, 79 (04) : 709 - 712
  • [6] Electrochemical effect of Copper Gleam additives during copper electrodeposition
    Dela Pena, E. M.
    Roy, S.
    TRANSACTIONS OF THE INSTITUTE OF METAL FINISHING, 2017, 95 (03): : 158 - 164
  • [7] INITIAL-STAGES OF COPPER ELECTRODEPOSITION IN THE PRESENCE OF ORGANIC ADDITIVES
    MICHAILOVA, E
    VITANOVA, I
    STOYCHEV, D
    MILCHEV, A
    ELECTROCHIMICA ACTA, 1993, 38 (16) : 2455 - 2458
  • [8] Electrodeposition of Copper in the Presence of Aliphatic and Aromatic Diamines as Organic Additives
    Abdel-Rahman, H. H.
    Harfoush, A. A.
    Moustafa, A. H. E.
    ELECTROCHEMISTRY, 2012, 80 (04) : 226 - 238
  • [9] Effect of additives on shape evolution during electrodeposition - II. Parameter estimation from roughness evolution experiments
    Rusli, Effendi
    Xue, Feng
    Drews, Timothy O.
    Vereecken, Philippe M.
    Andricacos, Panos
    Deligianni, Hariklia
    Braatz, Richard D.
    Alkire, Richard C.
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2007, 154 (11) : D584 - D597
  • [10] Effect of additives on shape evolution during electrodeposition - III. Trench infill for on-chio interconnects
    Qin, Yan
    Li, Xiaohai
    Xue, Feng
    Vereecken, Philippe M.
    Andricacos, Panayotis
    Deligianni, Hariklia
    Braatz, Richard D.
    Alkire, Richard C.
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2008, 155 (03) : D223 - D233