Bulk growth of gallium nitride: challenges and difficulties

被引:22
|
作者
Bockowski, M. [1 ]
机构
[1] Polish Acad Sci, Inst High Pressure Phys, PL-01142 Warsaw, Poland
关键词
bulk growth; gallium nitride; HVPE method; high pressure growth from solution; GAN SINGLE-CRYSTALS; HIGH-NITROGEN-PRESSURE; VAPOR-PHASE EPITAXY; AMMONOTHERMAL METHOD; FREESTANDING GAN; LASER-DIODES; FLUX METHOD; CRYSTALLIZATION; THICK; NA;
D O I
10.1002/crat.200711002
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
The present status of the GaN bulk growth by High Pressure Solution (HPS) method and combination of HPS and Hydride Vapor Phase Epitaxy (HVPE) methods is reviewed. Up to now the spontaneous high pressure solution growth of GaN results in crystals having habit of hexagonal platelets of surface area of 3 cm(2) or needles with length up to I cm. Recently, the platelets and needles have been used as seeds for the HVPE growth. On the other hand, the LPE technique under pressure with pressure-grown GaN (hp-GaN), GaN/sapphire template, patterned GaN/sapphire template and free standing HVPE GaN as seeds has been examined and developed. (c) 2007 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
引用
收藏
页码:1162 / 1175
页数:14
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