Electrical Properties and Stability of Dual-Gate Coplanar Homojunction DC Sputtered Amorphous Indium-Gallium-Zinc-Oxide Thin-Film Transistors and Its Application to AM-OLEDs

被引:68
作者
Baek, Gwanghyeon [1 ]
Abe, Katsumi [2 ]
Kuo, Alex [1 ]
Kumomi, Hideya [2 ]
Kanicki, Jerzy [1 ]
机构
[1] Univ Michigan, Dept Elect Engn & Comp Sci, Displays & Detectors Lab, Ann Arbor, MI 48109 USA
[2] Canon Inc, Canon Res Ctr, Tokyo 1468501, Japan
关键词
Active-matrix organic light-emitting display (AM-OLED); amorphous indium-gallium-zinc-oxide (a-IGZO); coplanar homojuction; dual gate (DG); thin-film transistor (TFT); VOLTAGE; TFTS;
D O I
10.1109/TED.2011.2168528
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The electrical characteristics and stability of dual-gate (DG) coplanar homojunction amorphous indium-gallium-zinc-oxide thin-film transistors (a-IGZO TFTs) on glass substrates are described herein. In this device structure, both top gate (TG) and bottom gate are defined by lithography, allowing independent biasing when adjacent TFTs are present. The DG a-IGZO TFT demonstrates excellent electrical performance with subthreshold swing (SS) of 99 mV/dec, field-effect mobility of 15.1 cm(2)/V . s, and ON-OFF current ratio of 10(9). By applying various bias voltages on the TG electrode, it is found that the TFT threshold voltage can be controlled without any change of the SS and off current. Under conditions of negative bias temperature stress (BTS), the transfer curves of the TFT exhibit negligible shifts after 10 000 s. Larger shifts are observed under conditions of a positive BTS. Finally, the application of this DG device to active-matrix organic light-emitting displays is suggested.
引用
收藏
页码:4344 / 4353
页数:10
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