Machining of optical microstructures with 157 nm laser radiation

被引:9
作者
Temme, T [1 ]
Ostendorf, A [1 ]
Kulik, C [1 ]
机构
[1] Laser Zentrum EV, D-30419 Hannover, Germany
来源
FOURTH INTERNATIONAL SYMPOSIUM ON LASER PRECISION MICROFABRICATION | 2003年 / 5063卷
关键词
F2 excimer laser; micromachining; micro-optics; fused silica machining;
D O I
10.1117/12.540527
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The precision machining of glass by laser ablation has been expanded with the short wavelength of the 157 rim of the F2 excimer laser. The high absorption of this wavelength in any optical glass, especially in UV-grade fused silica, offers a new approach to generate high quality surfaces, addressing also micro-optical components. In this paper, the machining of basic diffractive and refractive optical components and the required machining and process technology is presented. Applications that are addressed are cylindrical and rotational symmetrical micro lenses and diffractive optics like phase transmission grating and diffractive optical elements (DOEs). These optical surfaces have been machined into bulk material as well as on fibre end surfaces, to achieve compact (electro) - optical elements with high functionality and packaging density. The short wavelength of 157 rim used in the investigations require either vacuum or high purity inert gas environments. The influence of different ambient conditions is presented.
引用
收藏
页码:233 / 237
页数:5
相关论文
共 11 条
  • [1] DYER P, 2002, PHOTONICS FABRICATIO
  • [2] GOLOVASHKIN G, 2002, METHODS COMPUTER DES
  • [3] Advanced laser microfabrication of photonic components
    Herman, PR
    Chen, KP
    Corkum, P
    Naumov, A
    Ng, S
    Zhang, J
    [J]. 1ST INTERNATIONAL SYMPOSIUM ON LASER PRECISION MICROFABRICATION, 2000, 4088 : 345 - 350
  • [4] Laser shaping of photonic materials: deep-ultraviolet and ultrafast lasers
    Herman, PR
    Marjoribanks, RS
    Oettl, A
    Chen, K
    Konovalov, I
    Ness, S
    [J]. APPLIED SURFACE SCIENCE, 2000, 154 : 577 - 586
  • [5] Laser ablation process of quartz material using F2 laser
    Jitsuno, T
    Mikata, H
    Tokumura, K
    Kuzuu, N
    Kitamura, N
    Kawaguchi, Y
    [J]. 1ST INTERNATIONAL SYMPOSIUM ON LASER PRECISION MICROFABRICATION, 2000, 4088 : 355 - 358
  • [6] KONOVALOV I, MAT RES SOC S, V617
  • [7] OSTENDORF A, 2001, 2 INT S LAS PREC MIC
  • [8] F2-laser ablation patterning of dielectric layers
    Schäfer, D
    Ihlemann, J
    Marowsky, G
    Herman, PR
    [J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2001, 72 (03): : 377 - 379
  • [9] TEMME T, 2003, LASE 2003 SAN JOS CA
  • [10] TONSHOFF HK, 2003, SPIE OPTIF 2003 ROCH